| 학회 |
한국재료학회 |
| 학술대회 |
2020년 가을 (11/18 ~ 11/20, 휘닉스 제주 섭지코지) |
| 권호 |
26권 1호 |
| 발표분야 |
G. 나노/박막 재료 분과 |
| 제목 |
Characteristics of Deposition RF-Power by sputter of Silicon Anode Electrode for Thin Film Battery. |
| 초록 |
The silicon anode electrode was deposited by RF magnetron sputtering on a Cu foil attached to the glass substrate. N-type Silicon (99.999%, 2 ”diameter x 1/4” thickness) was used as the target. Deposition RF-power increased from 100W to 400W. The deposited silicon was characterized using Alpha step, Scanning Electron Microscope (SEM) and Atomic Force Microscope (AFM). As deposition power increased, both thickness and surface roughness increased. |
| 저자 |
강성호, 정우섭, 조승희, 안민주, 심규연, 김효종, 변동진
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| 소속 |
고려대 |
| 키워드 |
<P>Thin-Flim Battery; n-type Silicon; RF-magnetron sputter</P>
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| E-Mail |
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