| 학회 |
한국화학공학회 |
| 학술대회 |
2016년 가을 (10/19 ~ 10/21, 대전컨벤션센터) |
| 권호 |
22권 2호, p.2577 |
| 발표분야 |
KIChE-SCEJ joint symposium(특별 심포지엄) |
| 제목 |
Unconventional photolithography dictated by reaction-diffusion process |
| 초록 |
Photolithography has served as the most convenient means to create 2D patterns. Here, we have developed a novel photolithographic method based on reaction-diffusion process to create 3D patterns. During radical polymerization, oxygen rapidly consumes radical and therefore inhibit propagation reaction. Therefore, the spatial gradient of oxygen concentration influences the growth of polymeric structure. When the rate of oxygen-inhibition reaction is comparable with that of oxygen diffusion, the oxygen gradient is spontaneously formed in the UV-exposed region due to the influx of oxygen from the unexposed region. The gradient can be further engineered by employing different sets of boundary conditions for oxygen source. Therefore, growth pathways of polymeric structures can be selected by controlling the boundary conditions, one of which enables the creation of unconventional 3D patterns. |
| 저자 |
Shin-Hyun Kim |
| 소속 |
Department of Chemical and Biomolecular Engineering |
| 키워드 |
photolithography; radical polymerization; reaction-diffusion
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| E-Mail |
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| 원문파일 |
초록 보기 |
