| 초록 |
Most of omniphobic surfaces are fabricated by rigid materials such as silicon or metal and also coated by chemical reagent. So, omniphobic surfaces using such methods are not bio-friendly. Doubly re-entrant structures with polymer emulated from omniphobic springtail skin are omniphobic, flexible and not treated chemical reagent. Methods such as etching or 3D printing are mainly used for these re-entrant structures. Here, we use Reaction-Diffusion Photolithography (RDP) for doubly re-entrant structure generation. Because conventional photolithography is to irradiate UV on the photoresist through the design of photomask, it has a limitation which can form only 2D structures. RDP overcomes this limitation and can fabricate complex structures by utilizing the oxygen gradient in the substrate. RDP process, radical polymerizations consist of initiation, propagation and termination. Because oxygen first reacts radicals and form peroxide molecules, we can utilize oxygen concentration gradient. |
