| 초록 |
Components made of quartz should have more plasma resistance to improve their life time in plasma processing chamber. A SiO2-Al2O3-Y2O3 glass material have better plasma resistance than quartz. However, it is difficult to coat the glass on quartz substrate because of large difference of coefficient of thermal expansion (CTE) between the glass and quartz. Aerosol deposition (AD) method has been studied as a technology to form a coating layer on quartz at room temperature without any additional heat treatment in low vacuum. In addition, the coating layer formed using this method is dense and uniform, has a proper adhesion despite of CTE mismatch. In this study, amorphous material using the SiO2-Al2O3-Y2O3 glass with various conditions was coated on quartz substrates by AD method. Their thicknesses and plasma etching rate were analyzed using the surface profiler and scanning electron microscope. The results showed that a glass coating layer on quartz is dense and higher plasma resistance than only a quartz. These fundamental experiments can be helpful in improving life time of quartz in in plasma processing chamber. |
