| 학회 |
한국화학공학회 |
| 학술대회 |
2010년 봄 (04/22 ~ 04/23, 대구 EXCO) |
| 권호 |
16권 1호, p.301 |
| 발표분야 |
분리기술 |
| 제목 |
Efficient stripping of photoresist on post metal etched wafer using a CO2-Pulse flow of supercritical fluid |
| 초록 |
Supercritical carbon dioxide (SCCO2) provides an attractive method for cleaning and stripping photoresist. Recently, it has been show that the SCCO2 process that involves pressurization/depressurization successfully deboneded the resist from the substrate and carried it away In this study, the supercritical CO2-Pulse cleaning with the periodic pressure swing operation of supercritical fluid between subcritical and supercritical conditions was conducted for removing photoresist in post metal etched wafer. The results indicate an almost complete removal of photoresist from the sampled wafers.
|
| 저자 |
김민성, 임종성, 유기풍
|
| 소속 |
서강대 |
| 키워드 |
supercritical CO2; Photoresist; Stripping
|
| E-Mail |
|
| 원문파일 |
초록 보기 |
