| 학회 |
한국고분자학회 |
| 학술대회 |
2008년 가을 (10/09 ~ 10/10, 일산킨텍스) |
| 권호 |
33권 2호 |
| 발표분야 |
액정/LCD 재료 |
| 제목 |
Fabrication of superhydrophobic surface by liquid crystal lithography (TFCDs array) and reactive ion etching technique |
| 초록 |
A superhydrophobic surface is a surface with a water contact angle close to or higher than 150o. The research on superhydrophobic surfaces and the related phenomenon of high contact angles dates back a long time. Here, we present that perfect ordered arrays of toric focal conic domains (TFCDs) covering large areas can be formed by semi-fluorinated smectic liquid crystals. Combined with suitable surface treatment for random planar anchoring and controlled geometry, that is, a patterned wafer, our smectic liquid-crystal system exhibits a high density of TFCDs that are arranged with remarkably high regularity through large area. We have fabricated well-ordered, tunable superhydrophobic surface whose water contact angle can be tuned from 95° to 160° using a combination of liquid crystal lithography and conventional reactive ion etching method. It is the combination of surface roughness and low-surface-energy modification of fluorine liquid crystal that leads to superhydrophobicity. |
| 저자 |
김윤호1, 정희태1, 윤동기2, 정현수1, 윤은경1, 김정현1
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| 소속 |
1KAIST, 2삼성전자 반도체 총괄 |
| 키워드 |
superhydrophobic; liquid crystal
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| E-Mail |
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