| 학회 |
한국고분자학회 |
| 학술대회 |
2015년 봄 (04/08 ~ 04/10, 대전컨벤션센터) |
| 권호 |
40권 1호 |
| 발표분야 |
기능성 고분자 |
| 제목 |
Development of siloxane-based UV curable resins for roll-to-roll UV nanoimprint lithography for 100 nm pitch wire grid polarizer |
| 초록 |
UV nanoimprint lithography and Roll-to-Roll UV nanoimprint lithography are one of the promising techniques. For the realization of 100 nm pitch R2R-NIL, UV curable resins were formulated by using siloxane-based acrylates to precisely control the patternability, resin viscosity, and R2R-NIL processability. The curing time of the resins was measured photo DSC and shrinkage during curing process and etching resistance of the polymers were investigated depending on the ratio of siloxane-based acrylates. By using this resin, R2R-NIL process was conducted to fablicate 100 nm pitch wire grid polarizer (WGP). The resultant mold exhibited a high resolution capacity of 100 nm pitch, as well as the high durability and excellent releasing properties. The 70 nm thickness of Al layer was deposited on 100 nm pitch replicated mold to produce R2R-based WGP. The optical performance of the polarizer was confirmed by transmittance for both transverse magnetic (TM) and transverse electric (TE) modes. |
| 저자 |
이영철1, 배은진1, 강영훈1, 조상욱2, 정명영2, 조성윤1
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| 소속 |
1한국화학(연), 2부산대 |
| 키워드 |
nanoimprint; Roll-To-Roll; Wire Grid Polarizer
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| E-Mail |
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