화학공학소재연구정보센터
학회 한국재료학회
학술대회 2009년 봄 (05/21 ~ 05/22, 무주리조트)
권호 15권 1호
발표분야 반도체재료
제목 Point defect for AgGaSe2 single crystal thin film by hot wall  epitaxy
초록 A stoichiometric mixture of evaporating materials for AgGaSe2 single crystal thin films was prepared from horizontal electric furnace. To obtain the single crystal thin films,  AgGaSe2 mixed crystal was deposited on thoroughly etched semi-insulating GaAs(100) substrate by the hot wall epitaxy (HWE) system. The source and substrate temperatures were 630℃ and 420℃, respectively. The temperature dependence of the energy band gap of the AgGaSe2 obtained from the absorption spectra was well described by the Varshni's relation, Eg(T) = 1.9501 eV - (8.79 × 10-4 eV/K)T2/(T + 250 K). After the as-grown AgGaSe2 single crystal thin films was annealed in Ag-, Se-, and Ga-atmospheres, the origin of point defects of AgGaSe2 single crystal thin films has been investigated by the photoluminescence(PL) at 10 K.  The native defects of VAg, VSe, Agint, and Seint obtained by PL measurements were classified as a donors or acceptors type. And we concluded that the heat-treatment in the Ag-atmosphere converted AgGaSe2 single crystal thin films to an optical p-type. Also, we confirmed that Ga in AgGaSe2/GaAs did not form the native defects because Ga in  AgGaSe2 single crystal thin films existed in the form of stable bonds.
저자 홍광준, 김혜정
소속 조선대
키워드 point defect; hot wall epitaxy; single crystal thin film; thermal annealing; photoluminescence
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