| 학회 |
한국고분자학회 |
| 학술대회 |
2017년 가을 (10/11 ~ 10/13, 제주컨벤션센터) |
| 권호 |
42권 2호 |
| 발표분야 |
분자전자 부문위원회 I |
| 제목 |
Reduced Water Vapor Transmission Rates of Low-Temperature Solution-Processed AlOx Passivation Layers via Photo Annealing for Device Applications |
| 초록 |
Low-temperature sol-gel-derived aluminum oxide (AlOx) films via photo (UV) annealing and their water barrier properties were investigated. UV annealing process induced the formation of a dense metal-oxygen-metal bond (Al-O-Al structure) at low temperatures (＜200 °C) that are compatible with commercial plastic substrates such as polyethylene naphthalate (PEN). The density of the UV-annealed AlOx thin film at 180 °C was comparable to that of AlOx thin films that have been thermally annealed at 350 °C. Finally, we confirmed that a densely packed AlOx thin film was successfully deposited onto the PEN and polyimide (PI) substrates via UV annealing at low temperatures. The Ca corrosion test was used to measure the water vapor transmission rates (WVTRs) of AlOx thin films deposited onto PEN or PI substrates. These films revealed 0.0095 g m−2 day−1 (25 °C, 50% relative humidity) and 0.26 g m−2 day−1 of WVTRs, respectively. |
| 저자 |
백용화, 박찬언
|
| 소속 |
포항공과대 |
| 키워드 |
Passivation; Water Barrier Film
|
| E-Mail |
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