| 초록 |
A series of acid: Acetic Acid (AA), 4-trifluoromethyl benzoic acid (CF3BA), trifluoroacetic acid (CF3AA), and 4-toluene sulfonic acid (TsOH) were applied as an additive in the polyfluorene dimethylamino propyl and tested their effect as interlayer on device performance. The optimum amount of acid derivatives was found to be 1.0 eq. for all the devices based on ZnO/PFN. The PCEs of the devices with 1.0 eq. of AA, CF3BA, CF3AA, and TsOH were 9.9, 10.3, 10.3, and 10.6%, respectively, whereas the PCE of the device with pristine ZnO was 8.7%. We noticed that the most powerful acid derivative was TsOH. The devices based on polyfluorene with acid derivatives displayed decreased trap-assisted recombination and interfacial bimolecular recombination. Prominently, the decreased trap-assisted recombination of the devices corresponds with the trend of the efficiency of polymer solar cell devices and follows the trend of the acid dissociation constant of acid derivatives. |
