화학공학소재연구정보센터
학회 한국공업화학회
학술대회 2015년 가을 (11/04 ~ 11/06, 제주국제컨벤션센터(ICCJEJU))
권호 19권 2호
발표분야 고분자_포스터
제목 Synthesis of New Furan based methacrylate for replacing Bis-GMA
초록 BisGMA (Bisphenol”A”-bis-(2-hydroxypropyl) methacrylate) is one of the most famous curing resins and widely uses for many applications, especially for dental restorative material. However, there are many side effects of the release of Bis-phenol A in the human heath so BisGMA need to be replaced by others human friendly materials. Furan, which has origin from biomass, has emerged as a potential material that can replace aromatic core. New acrylate photo curing resins based on furanic core was synthesized and characterized, which have potential for replacing BisGMA
저자 신승한, Mai Toan
소속 한국생산기술(연)
키워드 photocuring methacylate BisGMA furan
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