화학공학소재연구정보센터
학회 한국고분자학회
학술대회 2014년 봄 (04/10 ~ 04/11, 대전 컨벤션센터)
권호 39권 1호
발표분야 기능성 고분자
제목 Fabrication of Sub-10 nm TiO2 Nanosheet Arrays via the Spacer-Defined Double-Patterning Process
초록 A novel approach for fabricating ultrahigh density sub-10 nm TiO2 nanosheet arrays with high aspect ratios by incorporating the spacer-defined double-patterning process with a nanoline template via atom layer deposition (ALD) was demonstrated. A nanoline template can be fabricated readily by pattern transfer from a thin silicon-containing block copolymer film into a thick cross-linked polymer layer. The excellent thermal stability of the cross-linked template allowed a high-temperature ALD process to deposit crystalline TiO2 thin films conformally on each surface of the nanoline template. After the template was removed using dry etching and calcination, highly crystalline anatase TiO2 nanosheet arrays with a length of several micrometers remained that were deposited conformally on both sides of the walls of the organic template. The width of the resulting TiO2 nanosheet could be controlled below half the space of the original lithographically defined nanoline template using ALD.
저자 박창홍1, 구세진2, 조경천1, 정경옥1, 김진백1
소속 1한국과학기술원, 2LG화학 기술원
키워드 block copolymer; TiO2 Nanosheet; atom layer deposition
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