| 초록 |
In this study, a facile method for the formation of graphitic carbon thin films through a radiolytic stabilization of polymer thin films followed by a high temperature pyrolysis was described. Polymer thin films spin-coated on the silicon wafer were irradiated with energetic ions under various conditions, and then pyrolyzed at 1000 oC under an inert atmosphere to form the graphitic carbon thin films. Based on the analytical results, the graphitic carbon thin films were successfully produced and their sheet resistance and transmittance relied on the fluences and film thicknesses. |
