| 초록 |
In the semiconductor manufacturing process the plasma regularity is a significant factor. We have developed a novel plasma diagnostic system for the monitoring of plasma density distribution. We employed irradiation sensitive polymerizable molecules in forms of electrospun fibers and spin coated films for plasma diagnostics. We were be able to monitor the plasma distribution due to the changes in optical properties of the sensor molecules upon exposure to the plasma. Furthermore, different extent of color and fluorescence changes was observed according to the plasma treatment level. This indicates that we can monitor plasma density, temperature gradient, kinetic energy separately using different combinations of the host polymer and sensor molecules. |
