| 초록 |
Roll-to-Roll UV nanoimprint lithography (R2R-UV-NIL) is one og the promising techniques for various electronic applications due to its low cost, simple process, and great precision. For the realization of 100 nm pitch R2R-UV-NIL, a novel fluorinated siloxane hybrid resin as a soft replica mold was designed and synthesized. The obtained hybrid resin possess a variety of properties for R2R-UV-NIL, Such as suitable resins were formulated by using this siloxane-based acrylate to precisely control the patternability, resin viscosity, and R2R-UV-NILprocessability. Replica mold with 100 nm pitch by R2R-UV-NIL process was fabricated using this hybrid resin. The resultant mold exhibited a high resolution patterning capacity of 100 nm pitch, as well as the high durability and excellent releasing propertise. Furthermore, R2R-NIL or UV-NIL process was conducted by using the replica mold to fabricate 100 nm pitch Wire Grid Polarizer (WGP). |
