| 초록 |
Since organic materials are highly sensitive to water and oxygen, organic devices required to protect them by encapsulation materials. We used organic moisture barrier using i-CVD (initiated-chemical vapor deposition). i-CVD process utilizes an initiator thermally induced radicals and these radicals react with vinyl monomers to form growing polymer chains. i-CVD process has many advantages such as without the use of a solvent, allowing for a convenient single-step polymerization and using any substrate including Si-waver, paper, plastic and fabric. In this study, we using vinyl monomer glycidyl methacrylate(GMA), cyclohexyl metacrylate(CHMA), 2,4,6,8-tetramethyl-2,4,6,8-tetravinylcyclotetrasiloxane(V4D4). These monomers are deposited on Si-wafer and PEN film. To observe moisture barrier characteristic, we analyzed FT-IR spectrum and calculated WVTR(water vapor transmission rate) value using electrical Calcium test under 85℃ and 85% RH. |
