| 초록 |
The polymer with tertiary butyl groups have been widely used for chemically amplified photoresists. However, these photoresists release the volatile byproduct, isobutene, by the acid-catalyzed deprotection reaction. The polymers with the tertiary caprolactone groups do not produce volatile byproducts during the deprotection reaction because those groups are cyclic. Therefore, those polymers can be used for low-outgassing photoresists. A novel methacryl monomer containing tertiary caprolactone was synthesized. From camphor, a tertiary lactone was synthesized through Baeyer-Villiger oxidation. The lactone was reacted with methacrylic acid to produce the monomer. |
