| 초록 |
Nanoporous organosilicate thin films are the most promising candidate material for ultra low-k films. To form nanopores, thermally degradable materials are used as a pore generating materials. Lots of materials with various degradation temperature are investigated to incorporate nanopores below 5 nm. For the materials with low degradation temperature, it can not be used as a porogen because porogen degradation before matrix vitrification cause pore collapse. In this study, photo curable method is suggested for low temperature curing. Photo acid generator(PAG) mixed with matrix material generates acid by UV irradiation for facilitating matrix condensation. Using this method, gemini surfactants with low degradation temperature can incorporate nanopores. Nanoporous films with gemini surfactants were characterized using nanoindender and MIM method for measuring mechanical properties and dielectric constant respectively. Absolute porosity of the films were measured by x-ray reflectivity experiment. |
