| 초록 |
Various microstructures are useful for a wide range of technologies, such as biomedical devices and energy storage. The current photolithography technique is approaching the physical barrier for downscaling to achievable feature sizes. The state-of-the art of microfabrication technology have focused on improving the resolution of the electrode to decrease the size utilizing diverse approaches, phase-shifting masks, and optical proximity correction. In this study, we proposed a novel single-mask photolithography methodology for the modulation of shape of the micropatterns without changing the masks. We controlled the fabrication parameters such as exposure dose and the soft-bake temperature. Our approach can provide a low-cost and high-throughput method. |
