| 학회 | 한국공업화학회 |
| 학술대회 | 2015년 가을 (11/04 ~ 11/06, 제주국제컨벤션센터(ICCJEJU)) |
| 권호 | 19권 2호 |
| 발표분야 | 나노_포스터 |
| 제목 | Direct writing based on Atmospheric Pressure AC microplasma |
| 초록 | The patterning methods based on direct writing have advantages to easily produce arbitrary and complex patterns in fewer steps and be used to fabricate a lithographic mask for subsequent pattern transfer. In here, we studied direct writing based on atmospheric pressure AC microplasma. It consists of an inner electrode, which is coupled to the power source, and the ground was placed on substrate to form stable AC microplasma. In order to reduce the scale of AC microplasma, we tuned the size of AC microplasma tube. As the results, we can successfully generate ~ 50 µm dimension of AC microplasma. With this technique, we developed direct writing for the patterning polymer film. Polyvinyl alcohol (PVA) was spin-coated on Si wafer and AC microplasma with He and O2 gas directly etched PVA film to create the arbitrary pattern. In this talk, we will discuss the results of direct writing based on AC microplasma which were characterized by scanning electron microscope (SEM), energy-dispersive X-ray spectroscopy (EDX), and atomic force microscopy (AFM). |
| 저자 | 이승환1, 김태환2 |
| 소속 | 1국가핵융합(연), 2부산대 |
| 키워드 | plasma; Direct writing; AC microplasma |
