| 학회 | 한국재료학회 |
| 학술대회 | 2017년 가을 (11/15 ~ 11/17, 경주 현대호텔) |
| 권호 | 23권 2호 |
| 발표분야 | G. 나노/박막 재료 분과 |
| 제목 | Multi-Density Structure of Al2O3 as a Moisture Permeation Barrier by Spatial Atomic Layer Deposition at Low Temperature |
| 초록 | Organic Light Emitting Diodes (OLEDs) especially require a highly advanced encapsulation layer due to the environmental vulnerability of OLED device. For a stable device operation, various encapsulation technologies have been developed. Among them, Thin Film Encapsulation (TFE) is required to future flexible electronics. Comparing different TFE techniques, thin films using Atomic Layer Deposition (ALD) have been shown to provide superior protection. In a single encapsulation layer with one single density, mechanism to form paths for outside H2O and O2 becomes easier because the defects in the layer are directly connected to the path formation. To attempt to improve moisture permeation property of passivation, laminated multi-density Al2O3 have been tested. This study describes the moisture permeation barrier properties of single layer and multi-density Al2O3 thin films deposited by spatial ALD at 100°C. Trimethylaluminum (TMA) was used as Al precursor and O3 was used as O reactant. A spacing of 1 – 4 mm was set between the gas injector and the movable substrate. A process gas amount of O3 was varied between 100 to 300 sccm. The experiments were performed with six samples: three reference 100-nm single density layers and three multi-density layers. Multi-density layers were fabricated with each 25-nm-thick layers with maintaining total thickness as 100-nm. The each multi density layers had different densities based on each O3 flow amount. The characteristics of the multi-density Al2O3 films were carried out using various techniques. The thickness of deposited Al2O3 films was measured by using spectroscopic. The film density was determined by X-ray Reflectrometry (XRR) and High Resolution Transmission Electron Microscopy (HRTEM). X-ray Photoelectron Spectroscopy (XPS) analysis was used to measure the amount of H2O in the inner layer of the single and multi-density layer structure. Finally, moisture barrier performances of Al2O3 films were characterized by using Water Vapor Transmission Rate (WVTR) value under MOCON and tritium test. |
| 저자 | 권세진, 신석윤, 최형수, 박현우, 방민욱, 이남규, 전형탁 |
| 소속 | 한양대 |
| 키워드 | ALD; encapsulation; Al2O3; multi density |
