초록 |
In this study, we investigated highly ordered nanostructures fabricated by block copolymers (BCPs) based lithography on nano-lines of poly(tetrafluro ethylene) (PTFE). The unique nano-lines of PTFE whose amplitude and pitch distance were around 17 nm and 150 nm, respectively were firstly fabricated by rubbing a PTFE bar on Si substrates at high temperatures because of a low friction coefficient and a high wear rate of PTFE. To enhance the wettability of BCP thin films, O2 plasma treatment was shortly carried out and a thin layer of poly(vinyl alcohol) (PVA) was sequentially spin-coated on the nano-lines. Then, BCP thin films were spin-coated and solvent-annealed in THF vapor to induce highly ordered BCP nanostructures assisted by underlying PTFE nano-lines in large area. These ordered BCP nanostrcutures and underlying PVA layer were used as templates to prepare various nanostructures which were characterized by AFM and SEM. |