화학공학소재연구정보센터
학회 한국고분자학회
학술대회 2015년 봄 (04/08 ~ 04/10, 대전컨벤션센터)
권호 40권 1호
발표분야 고분자구조 및 물성
제목 Ordering Behavior of Block copolymers on Nano-lines of Polymers
초록 In this study, we investigated highly ordered nanostructures fabricated by block copolymers (BCPs) based lithography on nano-lines of poly(tetrafluro ethylene) (PTFE). The unique nano-lines of PTFE whose amplitude and pitch distance were around 17 nm and 150 nm, respectively were firstly fabricated by rubbing a PTFE bar on Si substrates at high temperatures because of a low friction coefficient and a high wear rate of PTFE. To enhance the wettability of BCP thin films, O2 plasma treatment was shortly carried out and a thin layer of poly(vinyl alcohol) (PVA) was sequentially spin-coated on the nano-lines. Then, BCP thin films were spin-coated and solvent-annealed in THF vapor to induce highly ordered BCP nanostructures assisted by underlying PTFE nano-lines in large area. These ordered BCP nanostrcutures and underlying PVA layer were used as templates to prepare various nanostructures which were characterized by AFM and SEM.
저자 이동은, 이동현
소속 단국대
키워드 block copolymers; PTFE rubbing; self-assembly; thin films; solvent annealing
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