| 초록 |
Generally, fabrication of microlens arrays have been regarded as expensive and complicated process. Here, we propose a facile method to form a microlens and manipulate the lens curvature with the combination of residue-free nanoimprint lithography with V-shaped molds and thermal reflow of the polymeric structures. Nanoimprint lithography are a well-known method to construct micro- and nanostructures with low cost in high resolution. By using V-shaped molds, we can expose a substrate without residual-layers during nanoimprint lithography (NIL) if we control the initial thickness. Then, we use thermal reflow to realize spherical or cylindrically curved lenses by applying heat. By the residue-free process, we can enlarge the temperature and duration ranges because the polymers are pinned on the exposed substrate. Furthermore, we demonstrate to modulate the curvature of lenses by controlling initial polymer thickness coated on a substrate. |
