| 초록 |
Chemically amplified resists (CAR) have high sensitivity, but when applied to EUVL, they appear several disadvantages such as stochastics problem and pattern blurring due to acid diffusion. Non-chemically amplified resists (non-CARs) have high resolution and low sensitivity. We synthesized an alternating copolymer sensitive to E-beam, EUV radiation to simultaneously improve sensitivity and resolution. It was composed of perfluoroalkylated maleimide with non-CAR characteristics due to crosslinking reaction under E-beam and EUV irradiation and tert-butoxy styrene with CAR characteristics in the presence of PAG. We prepared a maleimide-styrene alternating copolymer via reversible addition fragmentation chain transfer (RAFT) polymerization. When applied to E-beam or EUV exposure with photoacid generator (PAG), a negative tone pattern was formed and the sensitivity of the resist could be improved. |
