| 학회 |
한국고분자학회 |
| 학술대회 |
2012년 봄 (04/12 ~ 04/13, 대전컨벤션센터) |
| 권호 |
37권 1호 |
| 발표분야 |
기능성 고분자 |
| 제목 |
A Novel Top Surface Imaging Approach Utilizing Selective Chemisorption of Diphenyl Siloxane Derivatives |
| 초록 |
A new top surface imaging process has been developed in which a silicon-containing compound is adsorbed selectively on a patternwise exposed non-chemically amplified resist film. This approach offers a higher resolution because of the anisotropic pattern transfer of a thin imaging resist film containing silicon into the underlying polymer film. The diphenylsiloxane oligomer acts as the etch barrier and is selectively located at the exposed region by amide bond formation. Eventually, the negative tone images featuring 0.2 μm line and space patterns were observed after oxygen reactive ion etching. We could avoid the problems of chemically amplified resists and take the advantages of top surface imaging. Also, this work is meaningful as a green chemistry since there is no development step using organic solvent. |
| 저자 |
김현희, 우승아, 김진백
|
| 소속 |
한국과학기술원 |
| 키워드 |
Chemisorption; Top Surface Imaging; Patterning
|
| E-Mail |
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