| 학회 | 한국공업화학회 |
| 학술대회 | 2018년 봄 (05/02 ~ 05/04, 대구 엑스코(EXCO)) |
| 권호 | 22권 1호 |
| 발표분야 | (특별세션) 반도체 공정소재 |
| 제목 | ALD of metal oxide and sulfide thin films and its applications in PV |
| 초록 | ALD technology is attractive for photovoltaic devices due to its advantages of having very good uniformity and step coverage on non-planar surfaces. In practice, in the field of photovoltaic devices ALD thin films are utilizing in a wide variety of functional applications. In this study, we developed the several metal oxide and sulfide ALD processes and analyzed its thin film properties. The developed metal oxide and sulfide ALD thin films were applied to the photovoltaic devices and its characteristics were evaluated. |
| 저자 | 김대환, 이상주, 성시준, 강진규 |
| 소속 | 대구경북과학기술원 |
| 키워드 | ALD; photovoltaic |
