| 초록 |
Self-assembly of block copolymer (BCP) is simple and cost-effective method for the densely packed periodic arrays of nanometer scale with typical length scale of 10-100nm. But, the self-assembled nanostructures realizable in BCP thin films possess only simple and repeated patterns that are generally predetermined by BCP characteristics, such as block composition and molecular weight. In this work, we offer a simple route to create multicomponent nanopatterns of consisting of lines and dots through combination of the self-assembling PS-b-P2VP and PS-b-P4VP BCPs with different metal precursors. Furthermore, application of BCP self-assembly to on the topographically patterned substrate offers another opportunity to control the morphology of self-assembling materials. In our approach, e-beam lithography process was used to create topographically patterned substrate that could manipulate the self-assembly of two BCPs combined with different types of inorganic materials. |
