| 초록 |
Self-assembly of block copolymer in thin films have been widely used for nanofabrication due to its features of densely-packed periodic arrays. However, block copolymer self-assembly produces only simple, periodic patterns that are pre-determined by the composition, molecular weight and incompatibility of block copolymers. Several strategies have been devised with partial success, and in this work, we have tried a new approach where two different solutions of block copolymers dissolved in good and selective solvents, respectively, are combined together with inorganic precursors to produce mixed patterns of lines and dots of inorganic materials. For the purpose, cylinder-forming PS-b-P2VP were dissolved in benzene and toluene, separately, and then combined to produce thin film by spin-coating. AFM and SEM images show that the line and dot patterns of inorganic materials are mixed with different combinations without additional process. |
