| 학회 |
한국고분자학회 |
| 학술대회 |
2019년 가을 (10/09 ~ 10/11, 제주컨벤션센터) |
| 권호 |
44권 2호 |
| 발표분야 |
대학원생 구두발표 (영어발표, 발표15분) |
| 제목 |
A Photoimageable Copolymer System Enabling Perovskite Pattern Formation |
| 초록 |
To achieve device integration of organic-inorganic hybrid perovskites (OIHPs), thin film pattern fabrication is essential. “Top-down” lithography-based approach is desired for patterning applications; however, it is incompatible with OIHPs due to their poor stability against various solvents used in lithography process. A solution-based approach can be utilized; however, resulting perovskites mostly reveal irregular roughness of film surface, indicating randomly oriented crystal domains with large grain boundaries, which are eventually undesirable to final properties. To address the challenges, we demonstrate CH3NH3PbI3 pattern formation by chemical vapor deposition on photolithographically defined poly(GMA-r-NBOCMA) template system which does not provide problematic chemical moieties to perovskites during the process. Finally, we show photoluminescence and photodetector device studies highlighting the applicability of our pattern formation approach to optoelectronic applications. |
| 저자 |
안솔1, 김기민1, 형석기2, 이승기2, 신내철1, 김명웅1
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| 소속 |
1인하대, 2KIST |
| 키워드 |
organic-inorganic hybrid perovskites; perovskite patterning; CVD; random copolymer; photocrosslinkable polymer
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| E-Mail |
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