| 초록 |
Colloidal quantum dots(QDs) are promising materials for optoelectronic devices based on high luminescence efficiency and extremely high color purity with narrow spectral bandwidth. To implement quantum dot light-emitting diodes with excellent performance based on the advantages of these materials, patterning technology capable of forming QD films without degrading the characteristics of QDs is essential. Here, we devise a dual ligand system for QDs that crosslinkable ligands and dispersing ligands are introduced to the surface of QDs. Thanks to chemically engineered crosslinkable ligands containing photoreactive moieties, chemically robust QD films can be formed under short-time UV-A irradiation. This non-destructive direct photopatterning system does not degrade the optical properties of QDs and can be applied to commercialized photolithography processes. By controlling dispersing ligands, QDs can be compatible with almost all solution processes, thereby enabling photolithography and inkjet printing without restrictions. This approach is an efficient way to promote the practical use of QDs in next generation displays. |
