| 학회 |
한국고분자학회 |
| 학술대회 |
2016년 봄 (04/06 ~ 04/08, 대전컨벤션센터) |
| 권호 |
41권 1호 |
| 발표분야 |
기능성 고분자 |
| 제목 |
Positive Type Photosensitive Polyimide Patterning: Effect of Cross-linkers (XLs) |
| 초록 |
We prepared a series of positive type photosensitive polyimide formulation which can be classified as a chemically amplified three component PSPI system composed of a polymer matrix, a cross-linker(XL), and a photoacid generator(PAG). The PHI was chosen among the highly transparent PHIs to the i-line and synthesized from 4,4′-hexafluoroisopropylidenebis(phthalic anhydride) (6FDA) and 2,2-bis(3-amino-4-hydroxyphenyl)hexafluoropropane(6FHAB) through ring-opening polymerization and subsequent thermal cyclization. Cross-linkers were also obtained by reacting 2-chloroethyl vinyl ether with phenol derivatives of bisphenol A, bishydoxyphenyl fluorene and triphenylenes in the presence of strong inorganic base, NaOH. N-hydroxynaphthalimide friflate was used as a PAG. In this presentation, we will show the syntheses of the novel cross-linkers derived from the triphenylene compounds and compared the effect of cross-linkers on the micro patterning of positive type photosensitive polyimide. |
| 저자 |
도선정, 가재원, 이성구, 원종찬, 이미혜, 김진수
|
| 소속 |
한국화학(연) |
| 키워드 |
photosensitive polyimide; crosslinker; photoacidgenerator
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| E-Mail |
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