화학공학소재연구정보센터
학회 한국고분자학회
학술대회 2014년 가을 (10/06 ~ 10/08, 제주 ICC)
권호 39권 2호
발표분야 고분자합성
제목 Study of Positive-tone High Temperature Photo-resist
초록 Study of Positive-tone High Temperature Photo-resist 김준표, 이승우†, 이명준, 석웅철, 유은주 영남대학교 Photosensitive polyimides (PSPI) have been studied to replace conventional polyimides since non-PSPI could reduce the number of processing steps in semiconductor packing by removing the photoresist related processes. Polyimides have been widely used as buffer layers and dielectric layers for semiconductor devices because of their excellent properties such as high thermal stabilities, chemical resistance and good mechanical properties.
저자 김준표, 이승우, 유은주, 석웅철, 이명준
소속 영남대
키워드 Photosensitive polyimides; polybenzoxazoles; polyhydroxyamide
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