| 학회 |
한국고분자학회 |
| 학술대회 |
2013년 가을 (10/11 ~ 10/12, 창원컨벤션센터) |
| 권호 |
38권 2호 |
| 발표분야 |
기능성 고분자 (포스터발표만 진행) |
| 제목 |
Studies on new polyhydroxyamides for the improved patterning by photolithography |
| 초록 |
Polybenzoxazoles have attracted much attention as insulation material in many microelectronic devices due to their excellent physical and electrical properties. When photosensitive polybenzoxazoles are used, a variety of pattern shapes can be effectively introduced by the photo lithography. Reliability of the lithography patterning and uniformity of pattern shapes are important for the proper functioning of electronic devices. These features are believed to be mostly affected by the structure of polybenzoxaole precursors, polyhydroxyamides. We will report the synthesis of new polyhydroxyamides and their lithographic behaviors resulting in the improved pattern profiles. |
| 저자 |
권효영, 남궁란, 전환승, 김종섭
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| 소속 |
제일모직 |
| 키워드 |
Polyhydroxyamide; pattern profile
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| E-Mail |
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