| 학회 | 한국고분자학회 |
| 학술대회 | 2003년 가을 (10/10 ~ 10/11, 부경대학교) |
| 권호 | 28권 2호, p.73 |
| 발표분야 | 특별 심포지엄 |
| 제목 | Template fabrication for nano-lithography using block copolymers with vertically oriented cylindrical morphology |
| 초록 | Porous nano structure of block copolymers has attracted much attention for their possible use as templates for nano lithography. For the practical use, controllability of the dimension and regularity of the nano structure are the key factors. In this study, we present methods to control the dimension of the pore size using Poly(styrene-block-methylmethacrylate) with perpendicularly oriented cylindrical morphology of PMMA. The pore size was successfully controlled from a few nanometers to about 50 nanometers. And the length of perpendicularly oriented pores was varied from ~30 nm to ~300 nm. Combining the size and length can give large aspect ratio of the regularly arranged pores. This work was supported by the Natioal Research Laboratory Program by MOST. |
| 저자 | 김진곤, 정운용, 고동한 |
| 소속 | 포항공과대 |
| 키워드 | nano lithography; template; block copolymer; poorous structure |
