| 학회 |
한국고분자학회 |
| 학술대회 |
2006년 봄 (04/06 ~ 04/07, 일산킨텍스) |
| 권호 |
31권 1호 |
| 발표분야 |
고분자 구조 및 물성 |
| 제목 |
Kinetics of Cationic Photopolymerizations of UV-curable Epoxy-based Negative Photoresists With and Without Silica Nanoparticles |
| 초록 |
Photocuring kinetics of protonic-acid-initiated cationic polymerizations of UV-curable epoxy-based negative photoresist systems with and without silica nanoparticles were assessed using photodifferential scanning calorimetry(Photo-DSC) and FTIR spectroscopy. Photo-DSC analysis using an autocatalytic kinetics model demonstrated that the cross-link density and cure rate increased as the concentration of silica nanoparticles with surface silanol groups increased to 2.5 wt%. This result was confirmed by FTIR spectroscopy, and suggests that the presence of silica nanoparticles at up to 2.5 wt% promoted the cure conversion and cure rate of the UV-curable hybrid organic–inorganic negative photoresists due to the synergistic effect of silica nanoparticles acting both as an effective flow or diffusion-aid agent and as a proton-donor cocatalyst during the cationic photopolymerization process. |
| 저자 |
주형태1, 조정대2, 한승택1, 이상섭1, 홍진후1
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| 소속 |
1조선대, 2한국광기술원 |
| 키워드 |
photocuring kinetics; cationic photopolymerization; negative photoresist; silica nanoparticles; photo-DSC
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| E-Mail |
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