| 학회 | 한국재료학회 |
| 학술대회 | 2010년 봄 (05/13 ~ 05/14, 삼척 팰리스 호텔) |
| 권호 | 16권 1호 |
| 발표분야 | B. Nanomaterials Technology (나노소재기술) |
| 제목 | Investigations on Molybdenum Nitride Films Deposited by r.f. Sputtering |
| 초록 | Molybdenum nitride films deposited on the p-type Si(100) substrate using r.f. magnetron sputtering at different nitrogen and argon pressures have been studied. Molybdenum nitride films were investigated by X-ray diffraction (XRD), scanning electron microscopy (SEM), spectroscopic ellipsometry (SE), atomic force microscopy (AFM), and X-ray photoelectron spectroscopy (XPS). The XRD results show that the phase and crystalline sizes of molybdenum nitride films were affected by the plasma gas ratio. The thickness of molybdenum nitride films was about 300 nm. And the thickness obtained from SEM images was consistent with that from SE data. The chemical properties, such as qualitative, quantitative analysis, oxidation state of Mo nitride films were analyzed by XPS. |
| 저자 | 박주연, 강용철 |
| 소속 | 부경대 |
| 키워드 | molybdenum; nitride; film; XPS |
