| 초록 |
In a semiconductor process, a p-type impurity, boron should be thoroughly removed in ultra-pure water. Boron is a weakly-ionized species that is difficult to completely remove through conventional electro-deionization process. Alternatively, the removal of boron is conducted by chelation with molecules having multi-hydroxyl functional groups. Here, chelating agents were introduced through terpolymerization with methacrylate (MMA), glycidyl methacrylate (GMA), and divinylbenzene, followed by functionalization by N-methyl-D-glucamine. The mechanical property of the prepared beads, the boron adsorption capacities, and the kinetics were studied by varying the ratio of MMA and GMA systematically. |
