| 초록 |
We have developed a novel approach to fabricate hierarchically organized vertical CNT arrays by combining plasma-enhanced CVD (PECVD) with self-assembled block copolymer nanotemplates. Unlike other nanopatterning techniques such as focused electron-beam lithography or scanning probe lithography, block copolymer assembly is a parallel patterning process, thereby enabling easy scale-up. In our approach, an asymmetric block copolymer, polystyrene-block-poly(methyl methacrylate) (PS-b-PMMA) has been used to form cylindrical nanostructures with center-to-center distances between neighboring cylinders of 72 and 34 nm. We have demonstrated a facile and robust hierarchical organization process for realizing vertically aligned and uniformly nanopatterned CNTs. |
