| 초록 |
We have proposed Soft-Imprint technique using polymerization at room temperature that is a simple, cheap and reproducible method for the patterning of large areas, and that allows the transfer of polymer patterns at the submicron scale without high pressures. Using Soft-Imprint method, we introduce PDMS mold and TEM grid and create 3D-structures, which is difficult to produce using conventional photolithography for several reasons. Also, we produce 3D-structures with the combination of Soft-Imprint technique and photolithography. These methods to fabricate 3D-structures would be useful in a number of areas of microelectronics. |
