| 학회 |
한국고분자학회 |
| 학술대회 |
2003년 봄 (04/11 ~ 04/12, 연세대학교) |
| 권호 |
28권 1호, p.357 |
| 발표분야 |
분자전자 부문위원회 |
| 제목 |
A Soft-Imprint Technique for Submicron Structure Fabrication via in-situ Polymerization |
| 초록 |
A new soft-imprint technique for fabrication of submicron scale polymer structures that can be simply performed at room temperature by polymerization with an elastomeric polydimethylsiloxane (PDMS) mold is proposed. The PDMS mold is placed on a fluid mixture of prepolymer and monomer after a brief UV exposure, full polymerization follows, and then the mold is removed. The submicron scale polymer structures are produced without any defect or distortion and with good pattern fidelity. Several square centimeters of patterned polymer structure can be fabricated through the use of the soft mold. |
| 저자 |
최원묵;박오옥 |
| 소속 |
한국과학기술원 생명화학공학과;한국과학기술원 생명화학공학과 |
| 키워드 |
soft-imprint; PDMS; microfabrication; polymerization.
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| E-Mail |
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