| 학회 |
한국고분자학회 |
| 학술대회 |
2018년 봄 (04/04 ~ 04/06, 대전컨벤션센터) |
| 권호 |
43권 1호 |
| 발표분야 |
고분자가공/복합재료 |
| 제목 |
Multi-spectral and wide gamut color generation via e-beam lithography based on resonant scattering reduction |
| 초록 |
Optical filters play a significant role in high-speed chips and display applications. To achieve higher resolution, it is required to miniaturize the optical filters. Many designs have been implemented that rely on structural color via surface plasmon polaritons (SPPs).However, many reported color pixels have failed to realize color of high purity at subwavelength sizes because of their strong dependence on periodicity. Herein, we propose an optical pixel design that does not rely on SPPs, but on the resonant reduction of scattering via a metal-semiconductor-metal hybrid nanostructure array. Such nanostructure can transmit certain wavelengths of visible light even with a single array element without any degradation in spectral response.By arranging individual elements into an array, we can create color pixels that exhibit wide gamut and highly efficient transmission.Furthermore, by effectively combining different elements in to an array, we can allow multi-bandpass transmission. |
| 저자 |
이준상1, 박지연1, 정경민1, 전석우2, 김동하1, 현가담1
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| 소속 |
1이화여자대, 2한국과학기술원 |
| 키워드 |
E-beam lithography; nano-photonics; optical filter
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| E-Mail |
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