| 학회 |
한국고분자학회 |
| 학술대회 |
2002년 가을 (10/11 ~ 10/12, 군산대학교) |
| 권호 |
27권 2호, p.338 |
| 발표분야 |
분자전자 부문위원회 |
| 제목 |
AdPOC and t-AdOC as New Deprotecting Groups in Photoresist Material |
| 초록 |
t-Butyloxycarbonyl group(t-BOC) is a well known deprotecting group in photoresist material because of its easily cleavable characteristics and high thermal stability. 1-Adamantyloxycarbonyl(t-AdOC) and 1-(1-adamantyl)-1-methylethoxy carbonyl(AdPOC) groups can be cleaved much faster than t-BOC group in room temperature and mild acidolytic condition. We introduce the t-AdOC and AdPOC groups as new debloking groups instead of t-BOC group in photoresist material. In this research we will describe the possibility of these groups as novel deblocking groups and will show the characteristics such as thermal stability, UV absorbance, and the performance of the photoresist by using these groups.
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| 저자 |
김진백1, 장지현2
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| 소속 |
1한국과학기술원 화학과, 2분자과학 사업단(BK 21) & 기능성 고분자 연구센터 |
| 키워드 |
t-BOC group; AdPOC group; t-AdOC group; Photoresist Materail
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| E-Mail |
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