| 학회 | 한국재료학회 |
| 학술대회 | 2018년 봄 (05/16 ~ 05/18, 삼척 쏠비치 호텔&리조트) |
| 권호 | 24권 1호 |
| 발표분야 | A. 전자/반도체 재료 분과 |
| 제목 | New method of graphene patterning for high-speed photodetectors |
| 초록 | Two-dimensional materials have attracted strong interest for their fascinating electronic properties and have shown many advantages in optoelectronic applications. Among two-dimensional materials, graphene and related materials have demonstrated promising applications in various types of photodetectors from terahertz to ultraviolet, due to their ultrahigh carrier mobility and light absorption in broad wavelength range. However, weak light absorption and the absence of a gain mechanism that can generate multiple charge carriers from one incident photon have limited the responsivity of graphene based photodetectors. Here, we present a new method of graphene patterning for photodetectors with high speed and high responsivity. This device acts as a dual-gate to create a p-n junction in the optical absorption region and offers fast response times and compatibility with CMOS technologies. |
| 저자 | 이정상1, 인재현2, 주현수1, 김상식2, 이전국1 |
| 소속 | 1Korea Institute of Science and Technology, 2Korea Univ. |
| 키워드 | <P>two dimensional material; graphene; patterning; photodetector</P> |
