| 초록 |
Ultrapure water, which is essentially water free of contaminants, is required in industries such as semiconductor, pharmaceuticals and biotechnology. In semiconductor industries, one of the most undesirable contaminants in ultrapure water is dissolved oxygen(DO). Presence of the DO in ultrapure water will result in a formation of a native oxide layer on the silicon wafer surface during the cleaning process. This native oxide layer may hinder the development of more high-performance processes in the subsequent production stages such as the low-temperature growth of high-quality epitaxial silicon thin films. In this study, we have prepared catalyst-dopped asymmetric membranes and studied DO removal from water. The effects of various operating conditions on the overall performances of the membranes for the DO removal have been studied. |
