| 학회 | 한국재료학회 |
| 학술대회 | 2009년 가을 (11/05 ~ 11/06, 포항공과대학교) |
| 권호 | 15권 2호 |
| 발표분야 | B. Nanomaterilas Technology(나노소재 기술) |
| 제목 | Investigations on zirconium nitride thin films prepared by r.f. sputtering with varying N2/Ar ratio |
| 초록 | Zirconium nitride thin films deposited at different nitrogen and argon pressures using r.f. magnetron sputtering technique have been studied. The structure, morphology, thickness, and composition of zirconium nitride films were obtained by X-ray diffraction (XRD), X-ray photoelectron spectroscopy (XPS), atomic force microscopy (AFM), and spectroscopic ellipsometry (SE). Studies of the interfacial chemistry is also studied by Auger electron spectroscopy(AES). |
| 저자 | 박주연, 강용철 |
| 소속 | 부경대 |
| 키워드 | zirconium nitride; thin film; X-ray photoelectron spectroscopy |
