| 초록 |
This study introduces a generalized block copolymer nanolithography, which is applicable to the most of earth’s matter including metals, semiconductors, ceramics and even polymers. Although block copolymer is considered to provide parallel nanopatterning process, which may overcome the resolution limit of conventional photolithography, it has been mostly applied to silicon based maters so far. It is largely due to the difficulty in controlling the orientation of those anisotropic nanoscale morphologies on an arbitrary substrate. Here, we present that a generalized process to apply block copolymer lithography to various functional materials. We also present chemical patterning process for our universal block copolymer lithography, potentially useful to establish directed assembly techniques for well-ordered device-oriented functional nanostructures. |
