| 학회 |
한국고분자학회 |
| 학술대회 |
2005년 봄 (04/14 ~ 04/15, 전경련회관) |
| 권호 |
30권 1호, p.4 |
| 발표분야 |
신진 연구자 특별심포지움 |
| 제목 |
Highly Ordered Nanoporous Thin Films via the Self-Assembly of Triblock Copolymers |
| 초록 |
Diblock copolymer films of poly(styrene-b-ethylene oxide) (PS-PEO) exhibiting cylindrical microdomains, where PS is the major component, demonstrate a high degree of long range lateral order by solvent casting followed by solvent annealing. These materials are however not technologically useful since the PEO domains cannot be removed. To overcome this problem and generate nanoporous films, a third, center block (PMMA) that is photodegradable by ultra violet radiation (UV) was incorporated into the structure. This provides a robust manufacturable route to highly ordered, nanoporous arrays polymer films. Triblock copolymers of poly(styrene-b-methyl methacrylate-b-ethylene oxide) (PS-PMMA-PEO) were synthesized by living free-radical polymerization. Various molecular weights and compositions were used, where PS is the major component, and PMMA and PEO are the minor components. After casting and solvent annealing, all three copolymers exhibit similar cylindrical microdomains with a highly long-range lateral order. Subsequently, the PMMA block could be degraded by exposure to UV radiation and, by rinsing in acetic acid and water, the PEO cyclinders removed to give the desired PS based nanotemplate. |
| 저자 |
방준하1, Seung Hyun Kim2, Eric Drockenmuller3, Craig J. Hawker4, Thomas P. Russell5
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| 소속 |
1Materials Research Laboratory, 2Univ. of California, 3Santa Barbara, 4Department of Polymer Science Engineering, 5Univ. of Massachusetts |
| 키워드 |
Thin Film; Nanotemplate; Triblock Copolymer; living free-radical Polymerization
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| E-Mail |
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