| 학회 | 한국고분자학회 |
| 학술대회 | 2005년 가을 (10/13 ~ 10/14, 제주 ICC) |
| 권호 | 30권 2호 |
| 발표분야 | 분자전자 부문위원회 |
| 제목 | High Resolution Fluorescent Photoimag of Polymers Having tBOC-protected Dye Precursors by KrF Laser Lithography under Dry Process |
| 초록 | We have reported a unique photoimaging method that has been developed by taking advantage of a photolithographic technique based on the chemical amplification (CA) concept using tert-butyloxycarbonyloxy (tBOC) protected quinizarin [tBOC-Qz] dyes. In a CA process, the acid produced by a photochemical reaction with a photoacid generator (PAG) induces a cascade of subsequent chemical transformation through acid-catalyzed deprotection of the acid-labile tBOC protecting groups during a post-exposure bake (PEB) step in the polymers having tBOC-Qz dye precursors as shown in Figure 1. In this presentation, the copolymers of MMA and a styrene monomer tBQzSt having the acid-labile tBOC-Qz group as a pendent, were utilized to generate high resolution fluorescent photoimaging by a dry process. Photoimaging capabilities of the copolymers A, P(tBQzSt/MMA), were investigated by 248-nm exposure under a KrF excimer laser stepper for applications as latent photoimaging materials. Upon undergoing CA process, the strong UV absorption at 340 nm owing to the tBQzSt units of the polymer A disappeared and a new maximum absorption band at 480 nm along with strong fluorescence emission at around 580 nm appeared for confirming the recovery of the original quinizarin dye moieties in the polymers B. The polymer solutions containing P(tBQzSt/MMA) with varying monomer compositions and diazodisulfone (5 wt%) as a suitable PAG were prepared and spin-cast to form 0.5-μm thick films on substrates. The polymer films were imagewise-exposed with 20-80 mJ/cm2 by 248-nm irradiation through a photomask followed by post-exposure bake (PEB) at 110 ℃ for 60 sec. The fluorescent photographs exhibited bright yellowish 0.35-μm patterns at the irradiated portions in which efficient removal of the acid-labile tBOC groups occurred by the CA process. 1. K.-D. Ahn et al., Chem. Mater., 1998, 10, 2332. 2. K.-D. Ahn et al., Polymer, 2004, 45, 5391. 3. G. Pistolis, Chem. Mater. 2002, 14, 790. 4. K.-D. Ahn, C.-M. Chung, D. I. Koo, Chem. Mater., 1994, 6, 1452. 5. H. Ito, J., Polym. Sci.. Polym. Chem., 2003, 41, 3863. 6. K.-D. Ahn et al. Chem. Lett., 2001, 30, 716. 7. K.-D. Ahn et al. Macromol. Res., 2004, 12, 493. 8. C. Kocher et al. J. Mater. Chem., 2003, 13, 9. 9. J. C. Scaiano et al. Macromolecules, 2003, 36, 6692. |
| 저자 | 강종희1, 소진호1, 안광덕1, 유경욱2, 김상태2 |
| 소속 | 1한국과학기술(연), 2동우화인켐(주) 기술(연) |
| 키워드 | tBOC quinizarin; fluorescent photoimaging; lithography |
