| 학회 | 한국고분자학회 |
| 학술대회 | 2004년 봄 (04/09 ~ 04/10, 고려대학교) |
| 권호 | 29권 1호, p.208 |
| 발표분야 | 분자전자 부문위원회 |
| 제목 | Synthesis of Methacrylate-based Polymers with Ethyl-4-Methyl-2-Diazo-3-Oxo-Pentenoate and their Application as DUV Resists |
| 초록 | We synthesized a new type of polymer that has diazo-keto groups instead of acid labile protecting groups. The matrix polymer does not need a photoacid generator for the lithographic evaluation. And there is no necessity for the post-exposure bake step that is the cause of PED effects. Ethyl-4-methyl-2-diazo-3-oxo-pentenoate was synthesized and polymerized with hydroxy styrene, methacrylic acid, and adamantly methacrylate. The polymers showed bleaching effect after exposure. The thermal stability of the polymers is measured by TGA and DSC. The Characterizations of the polymers are achieved using other techniques such as FT-IR, NMR, GPC, and UV. Using Hg-Xe lamp in a contact mode printing, patterns were delineated |
| 저자 | 김진백, 김경선 |
| 소속 | 한국과학기술원 화학과 |
| 키워드 | Photoresist; DUV; Diazo group; Ethyl-4-methyl-2-diazo-3-oxo-pentenoate |
