| 초록 |
The TiO2 thin films were fabricated by electrochemical method using a sacrificial titanium anode in I2-added acetone bath. The TiO2 thin films were deposited on Pt substrates under the various conditions: applied-voltage, time, temperature. The morphologies of as-deposited films were found to be dependent on the applied voltage. The thickness of thin films with fixed applied-voltage were linearly increased with electrolysis time. The morphology and microstructure of the TiO2 thin films were investigated by X-ray diffractometery(XRD), Scanning electron microscopy (SEM), and Auger electron spectroscopy (AES).
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